Context: Art & Exhibiting: Nest
Laura Bechter, Gabrielle Schaad, Johanna Vieli
3 CreditsBFA-BFA-Ko.23F.006
Context: Art & Representation / Portfolio (Double module)
Martin Jaeggi, Nadia Graf
6 CreditsBFA-BFA-Ko.23F.005
Context: Introduction: The Art Field (2. Semester)
Mareike Dittmer, Jenifer Anne Catherine Fulton
3 CreditsBFA-BFA-Ko.23F.003
Kontext: Einführung: Das Kunstfeld (2. Semester)
Martin Jaeggi, Johanna Vieli
3 CreditsBFA-BFA-Ko.23F.002
Context: Diploma
Nummer und Typ | BFA-BFA-Ko.23F.004 / Moduldurchführung |
---|---|
Modul | Kontext |
Veranstalter | Departement Fine Arts |
Leitung | Jyrgen Ueberschär |
Zeit | |
Anzahl Teilnehmende | maximal 43 |
ECTS | 3 Credits |
Voraussetzungen | Course language: English & German |
Zielgruppen | BA Fine Arts students, mandatory for diploma students Not open to exchange-students |
Lernziele / Kompetenzen |
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Inhalte | This module is mandatory for all students who want to obtain their diploma. It forms the interface/support to the practice module in which, among other things, the diploma work is prepared. In addition, the module serves as an additional resource for working on the diploma work (additional self study time). Jyrgen Ueberschär (*1978) studied media art from 2002-2008 at the University of Art and Design Karlsruhe (HfG/ZKM) with Lois Renner and Elger Esser and with Jürgen Klauke at the Academy of Media Arts Cologne. In his photography, installations and film sequences, Ueberschär develops spatial scenarios at the interface between reality and fiction. He has had numerous solo and group exhibitions in Germany, Holland, Spain, Korea, Italy, France and China. Workshops and lectures, among others at the Academy of Art Nuremberg and the Musée de l'Elysée Lausanne. Martin Jaeggi (*1968) is an author, editor, curator, and lecturer. He studied film and video at the School of Visual Arts, New York, and the San Francisco Art Institute. Numerous publications on contemporary art and photography in newspapers, magazines and books. |
Leistungsnachweis / Testatanforderung | Mandatory attendance 100%, active participation |
Termine | Installation Diploma: CW 20: 15 / 16 / 17 / 19 May CW 21: 22 / 23 / 24 / 25 / 26 May Diploma colloquia: CW 22: 30 / 31 May, 01 / 02 June |
Bewertungsform | bestanden / nicht bestanden |